| abstract |
Disclosed is a composition comprising a polymer with a weight average molecular weight ofnfrom about 1,000 to about 100,000, said polymer containing at least some monomer repeat units withna first, photosensitivity-imparting substituent which enables crosslinking or chain extension of thenpolymer upon exposure to actinic radiation, said polymer also containing a second, thermalnsensitivity-imparting substituent which enables further crosslinking or chain extension of the polymernupon exposure to temperatures of about 140°C and higher, wherein the first substituent is not thensame as the second substituent, said polymer being selected from the group consisting ofnpolysulfones, polyphenylenes, polyether sulfones, polyimides, polyamide imides, polyarylene ethers,npolyphenylene sulfides, polyarylene ether ketones, phenoxy resins, polycarbonates, polyethernimides, polyquinoxalines, polyquinolines, polybenzimidazoles, polybenzoxazoles,npolybenzothiazoles, polyoxadiazoles, copolymers thereof, and mixtures thereof. |