| abstract |
A material containing, as a main component, an organicnsilicon compound represented by the following general formula:n R 1 x Si(OR 2 ) 4-x n(where R 1 is a phenyl group or a vinyl group; R 2 is an alkylngroup; and x is an integer of 1 to 3) is caused to undergonplasma polymerization or react with an oxidizing agent to formnan interlayer insulating film composed of a silicon oxide filmncontaining an organic component. As the organic siliconncompound where R 1 is a phenyl group, there can be listednphenyltrimethoxysilane or diphenyldimethoxysilane. As thenorganic silicon compound where R 1 is a vinyl group, there cannbe listed vinyltrimethoxysilane or divinyldimethoxysilane. |