| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b3cfdc2686d10506a737643e3e739e39 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-35
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-358
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-321
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-345 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-35
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-34 |
| filingDate |
1997-02-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_81cc187dc65177ebaf44e44a7a0d9a44 |
| publicationDate |
1997-08-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-0790328-A1 |
| titleOfInvention |
Thin film deposition |
| abstract |
A process of depositing thin film coatings by sputtering which comprisesn forming a plasma in an evacuated chamber; providing a source of material to be sputtered; locating a substrate to be coated in the chamber; causing the sputtered material to pass through the plasma and be deposited in the substrate wherein the plasma is generated by a helicon wave. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/GB-2343992-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/GB-2343992-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6463873-B1 |
| priorityDate |
1996-02-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |