http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0780694-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_040ec81c891acc3f3186f56cb99cf161 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S438-946 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-71 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01R31-2648 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-34 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-544 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01R31-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-71 |
| filingDate | 1996-12-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ca3fdf214add43a868e99e5660e3a1c3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_daa68f906fe6fa4731718bd60d7b52ab |
| publicationDate | 1997-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-0780694-A1 |
| titleOfInvention | Fabrication of a reference sample for a device for determination of the implanted dose |
| abstract | The invention relates to the production of a reference sample for a calibration of a device for characterizing doses implanted on a wafer (1), consisting in defining a succession of at least two parallel bands (Bi) on the wafer ( 1), depositing a first implantation mask on the wafer in a pattern leaving a first strip (B1) accessible, carrying out a first ion implantation of a first dose, eliminating the first mask and depositing a second mask d implantation on the wafer (1) in a pattern leaving accessible the first band (B1) and a second band (B2) contiguous, to perform a second ion implantation of a second dose, and to remove the second mask. |
| priorityDate | 1995-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 20.