| abstract |
A positive photoresist composition having excellentnvarious performances (e.g. resolution, resistance to timendelay effect, profile), small PEB dependence as well asnexcellent sensitivity, film retention and coatability, whichncomprises a polyvinylphenol resin whose phenolic hydroxylngroup is partially protected; a sulfonate of a N-hydroxyimidencompound as an acid generator; an amine compound; and annelectron donor having a redox potential of not more than 1.7neV is provided. |