http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0757372-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_040ec81c891acc3f3186f56cb99cf161 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J9-025 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J31-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B81B1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B81C99-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J9-02 |
| filingDate | 1996-04-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e28ca1a108ce1c3ba8dbc5a0ebc63c38 |
| publicationDate | 1997-02-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-0757372-A1 |
| titleOfInvention | Field emission display fabrication method |
| abstract | A process for fabricating vacuum microelectronic devices (especially field-emission displays) using a maskless self-aligned dense patterning step to define the emitter locations. This maskless patterning step is performed by applying charged particles to a pattern-transfer layer. Coulombic repulsion provides some self-regulating control of spacing, to approximate uniform density. Once the particles have thus been deposited, they can be used as the mask for an etching technique which will form the pointed cathode structures used for field emission displays. Thus, the present invention provides maskless patterning of one key step, and a corresponding reduction in cost. |
| priorityDate | 1995-07-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 19.