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filingDate 1994-11-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_101c3f5b51da1332f216e0b6ffab9fc7
publicationDate 1996-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-0739228-A1
titleOfInvention Recycling of wafer cleaning substances
abstract A method of recycling and purifying cleaning chemicals used in the production of semiconductor circuits and containing hydrofluoric acid and/or hydrochloric acid. Recycling of such chemicals is accomplished using separation and reconstitution steps. Hydrofluoric acid and hydrochloric acid cannot be distilled directly from a chemical solution as they form azeotropes with water. A low vapor pressure substance such as sulfuric acid or phosphoric acid is used to break the azeotrope while increasing the purity of the recovered chemicals and decreasing disposal problems. The method is useable at the point of use of the chemicals.
priorityDate 1994-01-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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