| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e415f6f1eeb8706d299ea086326248bf |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-023
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-28 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L61-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L61-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
1995-12-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4dd5a2b5e0671992a8d2ce607212ae27
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bda4cd8de2e173ec11e6bd802763de5a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_357569b7097e43f1aa598e4a374b8b1c |
| publicationDate |
1998-02-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-0735424-A3 |
| titleOfInvention |
Photoresist with photoactive compound mixtures |
| abstract |
A photoresist that is a mixture of the esterification product of an o-quinonediazidencompound and a novolak resin and a high molecular weight phenol having from 2 to 5 phenolicngroups and at least 4 diazo naphthoquinone groups. The extent of esterification of the novolaknresin is up to 20 percent of the hydroxyl groups and the degree of esterification of the phenol isnat least 50 percent of the phenolic hydroxyl groups. The preferred novolak resins are thenaromatic novolak resin that are the condensation product of a reactive phenol with anbis(hydroxymethyl)phenol or an aromatic aldehyde, each alone or in the presence of a reactivenphenol. |
| priorityDate |
1995-03-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |