| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7f9af914ed2fb00cd4f1b8b1a28964e4 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-4676
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-3452
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-0076 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L63-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L63-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0388
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G59-1494
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G59-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G59-4292
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F299-00 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K1-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G59-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G59-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F299-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D11-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L63-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L63-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033 |
| filingDate |
1995-09-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2006-02-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1f80e8212560f2a0affa6502bd088780
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e54fc583966d66475d16a6a5da3930ca
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_59c5719aa699473b35d39eeaff9e753c |
| publicationDate |
2006-02-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-0728788-B1 |
| titleOfInvention |
Process for producing photosensitive resin and liquid photosensitive resin composition |
| abstract |
A process for producing a photosensitive resin by the reaction of the carboxyl groups of a resin (A) having at least two (meth)acryloyl groups and at least one carboxyl group in its molecule with a difunctional epoxy resin (B) having two epoxy groups in its molecule. As the obtained resin comprises linear high-molecular-weight resin (A) blocks formed via the resin (B) block, it is excellent in tackfreeness and can be formed into a resist film. This film can be developed, after being irradiated with light, with an aqueous alkali solution rapidly and accurately. Therefore it has become possible to provide a high-performance liquid photosensitive resin composition useful for forming a solder resist for producing printed wiring boards, an electroless plating resist, a black matrix for liquid-crystal display panels, and a color filter. A liquid photosensitive resin composition containing minute particles of a polymer having a Tg of 20 °C or below gives a coating film which, after being photocured, is excellent in tight adhesion even when subjected to thermal history. |
| priorityDate |
1994-09-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |