http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0720059-A2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S210-909 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S210-908 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-425 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-422 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 |
| filingDate | 1995-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8706db23c64737210518141347954a52 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d05b51479077f7fbdaee262ce6cb16bf http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_38ab06945810ae9b2c72e7fb5a94219f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9f4136ebe23118488e0c2e340bbfcf8e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e9e0d13b68936676d13bdb5ca1e2cc59 |
| publicationDate | 1996-07-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-0720059-A2 |
| titleOfInvention | Method for treating photolithography developer and stripper waste streams containing resist and gamma butyrolactone or benzyl alcohol |
| abstract | A method is disclosed for using the simple, environmentally-friendly organic compounds gamma-butyrolactone and benzyl alcohol to develop and to strip free radical-initiated, addition polymerizable resists, cationically cured resists and solder masks and Vacrel photoresists. In all cases the developers and strippers include gamma butyrolactone or benzyl alcohol. The developers and strippers optionally also include a minor amount of methanol, ethanol, isopropyl alcohol, propylene glycol monomethylacetate, ethylene glycol monomethyl ether, formamide, nitromethane, propylene oxide, or methyl ethyl ketone, acetone and water. During development of the photopatterned resist or solder mask, the unpolymerized regions are dissolved in the disclosed developers. During stripping of the resist or solder mask, the polymerized regions are debonded from a circuit board in the disclosed strippers. Following removal of the developers and strippers, any residual monomers or polymers of the resist or solder mask as well as residual developing solution and stripping solution are rinsed from the printed circuit package. A method is also disclosed for treating the combined developer and stripper rinse effluents in an activated biomass to reduce the biological oxygen demand of the developer/stripper/resist/solder mask waste streams. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-19720413-C2 |
| priorityDate | 1994-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 310.