| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_eb2648e65ad8850515bd727a122f1186 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F17C2227-0135
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F17C2205-0326
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F17C2250-043
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F17C2227-044
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F17C2265-012
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F17C2260-053
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F17C2205-0341
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F17C2205-0335
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F17C2221-05 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B9-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B9-032
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B9-0321
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B9-0323
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F17C9-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/F17C9-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B9-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B9-00 |
| filingDate |
1995-12-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_33d0463a036b12f8bf836bd26d08fd09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_10bb0a47959cc96c927590dec5170588
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e68e944363d0390cfe05ed9de60431d9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_63422b74f635d8e7ce743dd854910151 |
| publicationDate |
1996-07-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-0719978-A2 |
| titleOfInvention |
A process for distributing ultra high purity gases with minimized corrosion |
| abstract |
A process for reducing corrosion in a gas distribution network of ultra high purity gas or any part of said distribution network, comprising:n (a) Wet cleaning the gas distribution network or at least one part thereof with a wet cleaning agent, (b) Liquid drying said gas distribution network or said at least one part thereof with an H 2 O desorbing liquid drying agent selected from the group consisting of acetone dimethylacetal DMP, 2.2 dichloropropane DCP or 2.2 dibromopropane DBP, mixtures thereof and any equivalent thereof, (c) purging said gas distribution network or any said part thereof with a dry high purity gas comprising less than 1 ppm of any impurity, and (d) evacuating said gas distribution network or any said part thereof at a pressure which is lower than 5x10 4 Pascal (e) exposing said gas distribution network or said any part thereof to an atmosphere comprising an ultra high purity corrosive gas or air. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8297304-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1102947-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1102947-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2004018118-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2157353-A1 |
| priorityDate |
1994-12-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |