http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0715349-A2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d78fe473c8a29219129bbc8bb50f6a59 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-14 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01R31-2607 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-6489 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-66 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-63 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01R31-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-66 |
| filingDate | 1995-11-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b799075e31b2614bd87069bbc0813c42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_33262538fb63b882ef6707ac7fa573c1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f8de5f11e19ed0bb57bca60a7a46d18b |
| publicationDate | 1996-06-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-0715349-A2 |
| titleOfInvention | Method of evaluating lifetime of semiconductor surface |
| abstract | A lifetime related quality evaluation method, used with a semiconductor wafer having a semiconductor thin layer over the main surface of a semiconductor substrate, for evaluating the lifetime related quality of the semiconductor thin layer and/or the vicinity thereof, wherein the method is characterized by: generating electron-hole pairs in the vicinity of a surface of the semiconductor thin layer by the use of excitation light having a larger energy than the band gap of a semiconductor to be tested; then detecting the intensity at a particular wavelength of light emitted by recombination of the electron-hole pairs; and evaluating the lifetime related quality of the semiconductor thin layer and/or the vicinity thereof based on the detected intensity. The lifetime related quality evaluation method realizes a non-contact, non-destructive quality evaluation of the epitaxial semiconductor wafer. |
| priorityDate | 1994-11-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559541 http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5461123 |
Total number of triples: 20.