| abstract |
A positive-working photosensitive composition is described, which comprises a polymer having a structural unit represented by the following formula [1] in a proportion of from 3 mol% to less than 60 mol%:n n wherein X¹ represents a hydrogen atom, a halogen atom or an alkyl group having from 1 to 4 carbon atoms; R¹ represents an alkyl group having from 1 to 6 carbon atoms, a halogen atom or an alkoxy group having from 1 to 6 carbon atoms; and m represents an integer of from 1 to 5. A process for image formation is also described, which comprises the steps of imagewise exposing a photosensitive material comprising a photosensitive layer containing the photosensitive composition, and then developing the photosensitive material with an aqueous alkaline solution having a pH of 12.5 or less. |