http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0672952-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-022 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 1995-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b79dcd3da1a10b92e6fa812279e12c9b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2ff88441c00665b0829ff51235a514e8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_45a27fe8ce21b3dd0d08f667f4ab69ec http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_11e035a81a5570e0b66a7b0dd23a2026 |
| publicationDate | 1995-09-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-0672952-A1 |
| titleOfInvention | Positive photoresist composition |
| abstract | A positive photoresist composition for super fine working is disclosed, which comprises (a) an alkali-soluble resin and (b) as a photosensitive compound the 1,2-naphthoquinonediazido-5-(and/or -4-)sulfonic acid ester of a polyhydroxy compound represented by formula (I) or (II), wherein in a high-speed liquid chromatography measured using a ultraviolet ray of 254 nm, the pattern of the diester component and the pattern of the complete ester component of said 1,2-naphthoquinonediazido-5-(and/or -4-)sulfonic acid of the polyhydroxy compound shown by formula (I) or (II) are at least 50% and less than 40%, respectively, of the whole pattern areas;n n wherein R₁ to R₁₁, which may be the same or different, each represents a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, or a cycloalkyl group, with the proviso that at least one of R₁ to R₁₁ is a cycloalkyl group, and R₁₂ to R₂₂, which may be the same or different, each represents a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, or a cycloalkyl group, with the proviso that at least one of R₁₂ to R₂₂ is a cycloalkyl group. The photoresist composition has a high resolving power and a less layer thickness reliance of the resolving power, and a wide development latitude, is reluctant to form a development residue, and further has a very excellent storage stability, and does not deposit the photosensitive material and does not form microgels with the passage of time. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0706089-A3 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0706089-A2 |
| priorityDate | 1994-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 404.