Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d1da4afba068d10fd30ae0bd07aee222 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_38e4b503b1979a5d277324483132316a http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_54d600ecc035c6e5261c9690dd1d6a67 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-321 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-402 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-507 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-507 |
filingDate |
1995-01-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f74fb7299ca776319606a5390af67bd2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dea59caf6af5e6e45752eff18d33927a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4955b9631f32387cd90aca6179e55494 |
publicationDate |
1995-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
EP-0665307-A2 |
titleOfInvention |
Film forming CVD-apparatus and method effected by the same |
abstract |
A plasma generating chamber (1) and a film forming chamber (7) are provided with a film forming apparatus of the present invention. A first reaction gas is introduced into the plasma generating chamber (1) to be plasmanized, and a second reaction gas is introduced into the film forming chamber (7). A wafer (15) on which a film is grown is placed in the lower part of the film forming chamber (7) while being biased by a voltage. The second reaction gas which is introduced into the film forming chamber (7) is activated by the first reaction gas in plasma state and is deposited on the wafer by virtue of a chemical reaction to thus form the film on the wafer. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1054433-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6403410-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-19523442-A1 |
priorityDate |
1994-01-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |