Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_573ed0443947a43bf018a4ead7944a81 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09C1-68 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00 |
filingDate |
1993-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7b3acf7b4be64d12fad675a025a47b11 |
publicationDate |
1995-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
EP-0636671-A1 |
titleOfInvention |
Polishing material |
abstract |
Described is a polishing material, particularly a polishing slurry, for particularly hard materials such as silicon carbide. The material comprises diamond particles with a median particle size of around one micrometer and alpha alumina particles with a median size of from about 20 to about 200 nanometers, and the diamond to alumina weight ratio in the material is from 1:30 to 1:90. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2017080535-A1 |
priorityDate |
1993-07-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |