| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_385752f237551ca1b257f160a0f2434b |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0048
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate |
1994-07-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_49f296cf1c7602359138e10119449d8a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b1e603a23a872550cc04f35a141abf87
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_89c963c2d8de40ba4a3f4b7269c0542a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8e4a0535ae0b4469eba64d13984040a6 |
| publicationDate |
1995-01-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-0633499-A1 |
| titleOfInvention |
Radiation sensitive resist composition |
| abstract |
A radiation-sensitive resist composition comprising a surface active agent having a perfluoroalkenyl group having 6 or more carbon atoms in the molecule. When said radiation-sensitive resist composition is filtered through a filter, the surface active agent is not adsorbed by the filter, so that striation is not caused and a coating film having a uniform thickness is always stably obtained from the above composition. Said radiation-sensitive resist composition is also excellent in developability. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107188869-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6673512-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1117002-A1 |
| priorityDate |
1993-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |