| abstract |
A Process is disclosed comprising reacting an alkali metal salt of Z with MX₄ to form a trihalo compound; reacting the trihalo compound with an alkali metal salt of Z' to form a dihalo compound; and reacting the dihalo compound with at least one alkali metal organic compound to form Z-MR₂-Z', where Z is a substituted or unsubstituted fluorenyl radical, M is Ge, Si, or Sn, X is Cl, Br, F, or I, each R is a hydrocarbyl radical containing 1 to 20 carbon atoms, and Z' is an unsubstituted cyclopentadienyl, substituted cyclopentadienyl, unsubstituted indenyl, substituted indenyl, unsubstituted fluorenyl, or a substituted fluorenyl. Also new fluorene compounds are disclosed. |