http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0602377-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5c24684033fba97d1ad845ce453a57e3 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-107 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C311-53 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F20-38 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C311-53 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C311-51 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F22-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate | 1993-11-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b4c6f135119112d7101744c7f015eec7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_735712f3b385ff39aad37ed258dd367e |
| publicationDate | 1994-06-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-0602377-A1 |
| titleOfInvention | Polymers containing N,N-disubstituted sulfonamide side groups and their use in radiation-sensitive compositions |
| abstract | a) eine unter der Einwirkung aktinischer Strahlung Säure bildende Verbindung und b) eine säurespaltbare Verbindung, deren Spaltprodukte in einem wäßrig-alkalischen Entwickler eine höhere Löslichkeit zeigen als die Ausgangsverbindung enthält, worin die säurespaltbare Verbindung ein Polymer der genannten Art ist, sowie ein Aufzeichnungsmaterial mit einem Träger und einer strahlungsempfindlichen Schicht. Das erfindungsgemäße Gemisch eignet sich insbesondere für die Herstellung von Offsetdruckplatten und Photoresists.The invention relates to monomers of the formulas R¹-SO₂-N (CO-OR²) -R³-O-CO-CR⁴ = CH₂ and R¹-N (CO-OR²) -SO₂-R³-O-CO-CR⁴ = CH₂, wherein R¹ for a (C₁-C₂₀) alkyl, (C₃-C₁₀) cycloalkyl, (C₆-C₁₄) aryl or (C₇-C₂₀) aralkyl radical, it being possible for individual methylene groups in the alkyl-containing radicals to be replaced by heteroatoms, R² for one (C₃-C₁₁) alkyl, (C₃-C₁₁) alkenyl or (C₇-C₁₁) aralkyl, R³ for an unsubstituted or substituted (C₁-C₆) alkyl, (C₃-C₆) cycloalkyl, (C₆-C₁₄) Aryl or (C₇-C₂₀) aralkyl radical and R⁴ represents a hydrogen atom or a methyl group. It also relates to polymers with at least 5 mol% of units with side groups of the formula (n) -R³-N (CO-OR²) -SO₂-R¹ (I) and / or -R³-SO₂-N (CO-OR²) - R¹ (II), and a radiation-sensitive mixture, the a) a compound which forms acid under the action of actinic radiation and b) an acid-cleavable compound whose cleavage products show a higher solubility in an aqueous alkaline developer than the starting compound contains, wherein the acid-cleavable compound is a polymer of the type mentioned, and a recording material with a support and a radiation-sensitive layer. The mixture according to the invention is particularly suitable for the production of offset printing plates and photoresists. |
| priorityDate | 1992-12-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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