| abstract |
Photoprotective compositions useful for topical application to prevent skin damage caused by acute or chronic exposure to ultraviolet light comprising chelating agents of formula (I), wherein each -R1 is independently selected from the group consisting of alkyl, aryl and heteroaryl, or the -R1's are covalently linked to form a cyclic alkyl; -R2 and -R3 represent -OR4, in this case there is no bond or polar bond between -R2 and the nitrogen covalently linked to -R3, each -R4 being independently selected in the group consisting of hydrogen, alkyl, aryl and heteroaryl except that the two -R4 are not methyl when the two -R1 are furyl; or -R2 is -O- and is covalently linked to nitrogen which is covalently linked to -R3, and -R3 is -O- (there is a charge + on the nitrogen to which it is linked) or zero ; -NR2 and NR3 are in amphi configuration when both represent -OH, and when the two -R1 are furyl or the -R1 are covalently linked to form a cyclohexanedione structure. Also described are methods of using such compositions to prevent skin damage caused by acute or chronic exposure to ultraviolet light. |