http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0594568-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_aa67eb74ea5b96d9f8f2cfdb3b025770 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-0057 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-08 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-34 |
| filingDate | 1990-08-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4a27f78f52ac6ff853addea3365106c2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_993697b0c0dfc8e89778998047564f22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2617226e5b3c96f92acf589164590f06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6dd249ce137eae0014153e03653719b4 |
| publicationDate | 1994-05-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-0594568-A1 |
| titleOfInvention | Method of depositing optical oxide coatings at enhanced rates |
| abstract | The invention relates to a sputtering method in which a substantially transparent target oxide film having predetermined optical properties is prepared, giving it substantially the same degree of absorption per unit of thickness as with the method using pure oxygen gas. as a single reactant, but at a higher speed than the process using oxygen gas as a single reactant. The implementation of the method of the invention consists in spraying a target substrate in a chamber while using a source of reactive oxygen. The reactive oxygen source has a reactivity in forming the target oxide which is improved over pure oxygen gas and includes nitrous oxide. The target oxide deposited on the substrate has an absorption per unit thickness which is substantially the same absorption per unit thickness as when pure oxygen gas is used as the sole reactant. The deposition rate is preferably controlled by a value derived from the plasma emission lines of oxygen atoms and target atoms. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-104975259-A |
| priorityDate | 1989-08-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 60.