| abstract |
Process for the vapor phase deposition of a fluorinated glass film on a substrate, in which said substrate (30) is brought into contact with vapor streams of the various constituents of said glass, characterized in that said vapor streams (12 , 22) are emitted simultaneously from at least two crucibles (10, 20), a first crucible (10) containing a welcome bath and the basic metal fluorides constituting said fluorinated glass, and at least a second crucible (20) containing doping elements consisting of at least one rare earth halide. |