| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fc6220b93fae4be14ada49e4ecc1860b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_be055db3c1a09879df07379ba969e223 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-00 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate |
1993-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1997-03-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2394160859afc187051fa35e1c5f5f7a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_db2c9481997264fcf7979f52409c012c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f26eb42f681042be2c10ccfed20dd22b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9c8d04ed01bc06dcc69b2b90070ecc9e |
| publicationDate |
1997-03-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-0579420-B1 |
| titleOfInvention |
Negative working resist material and pattern forming process |
| priorityDate |
1992-07-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |