http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0573348-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_37f4922dfb7777b019e504b885211b8e http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_481648b910607c5dcbe4ba1c7a2b84a8 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4488 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-14 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-448 |
| filingDate | 1993-06-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5a3b405b37f2b6817902d5411831169b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fb176ae6e428cc473587306092085f05 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e021f74249a6d03b0a1f918f7aaec714 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_97fa51131f53a78646f29e2876912f03 |
| publicationDate | 1993-12-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-0573348-A1 |
| titleOfInvention | Process for deposition of copper on a substrate and device for carrying out the process |
| abstract | (a) la production d'un halogénure métallique, in situ, à partir d'un moyen de production (11) inclus dans une chambre de réaction (10) contenant le substrat (30), par mise en contact d'un halogène gazeux avec un métal solide chauffé, et (b) la réduction, dans ladite chambre de réaction (10), dudit halogénure métallique gazeux produit au cours de l'étape (a), en présence d'au moins un gaz réducteur, pour l'obtention d'un dépôt de métal pur, à une vitesse de l'ordre du µm par minute, sur ledit substrat. The process includes: (a) the production of a metal halide, in situ, from a production means (11) included in a reaction chamber (10) containing the substrate (30), by contacting a gaseous halogen with a heated solid metal, and (b) reduction, in said reaction chamber (10), of said gaseous metal halide produced during step (a), in the presence of at least one reducing gas, in order to obtain a deposit of metal pure, at a speed of the order of μm per minute, on said substrate. n n n . une source d'halogène gazeux (22) ; . un support (20) contenant un métal sous forme solide ; . des moyens d'homogénéisation du flux de sortie de l'halogénure métallique gazeux formé, vers le substrat ; net des moyens de chauffage et de régulation de sa température (21). The device comprises a means (11) for in situ production of a gaseous metal halide, which comprises at least in combination: . a source of halogen gas (22); . a support (20) containing a metal in solid form; . means for homogenizing the outlet stream of the gaseous metal halide formed, towards the substrate; and means for heating and regulating its temperature (21). |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7977243-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1199378-A4 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6440494-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6656540-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7048973-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-0177407-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7659209-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1284305-A3 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1312696-A3 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1199378-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7279201-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1284305-A2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1312696-A2 |
| priorityDate | 1992-06-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 55.