| abstract |
A positive resist composition comprising an alkali-soluble resin and a light-sensitive quinonediazide material containing a quinonediazidesulfonic acid ester of at least one phenol compound represented by the following general formulas:n n wherein R₁ represents hydrogen, halogen, or the like; R₃ represents alkyl or phenyl; x represents 1-3; Q₁ to Q₁₂ represent hydrogen, alkyl or phenyl; and Z₁ to Z₅ represent the groups of the following formulas:n n wherein R₂ is hydrogen, halogen or the like; R₃ is as defined above; y is 1 or 2; and p is 0 or 1. This positive resist composition is excellent in the balance between properties such as resolution, profile, depth of focus, etc. |