| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_aeb5763779c04e3a8377ee335868ff11 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28562 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-285
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-18 |
| filingDate |
1993-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_07686c1023d89b0380b484797cb86cec
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_97af28cc10d1f52ea8718ed382979489 |
| publicationDate |
1993-11-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-0567985-A2 |
| titleOfInvention |
Process for thin film formation |
| abstract |
A process for thin film formation comprises selectively irradiating with an energy ray a substrate to the surface of which a surface treatment for providing hydrogen atoms is applied to thereby form an irradiated region and a non-irradiated region on the surface of the substrate, and forming a thin film selectively on the non-irradiated region. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/FR-2757881-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7061008-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-9829901-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-0218266-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/AU-2001281595-B2 |
| priorityDate |
1992-04-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |