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filingDate 1992-08-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 1997-11-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6d866610ebc997e1c7c57e54a481f0f3
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publicationDate 1997-11-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-0552382-B1
titleOfInvention A two layer structureresist and a process for producing it
abstract This invention relates to a double-layer resist characterized by comprising a thin film whose principal constituent is a conjugated system polymer and resist, wherein a thin film excellent in shading capability, anti-reflection property, and uniformity is provided and, thus, a radiation-sensitive double-layer resist to create fine resist patterns stable in workability can be provided.
priorityDate 1991-08-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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