http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0543961-B1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a2bcaf91101a370a3d64e3190366357f http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b76acd4e5682cc39195eb08699e41935 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C23-0075 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C23-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B3-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02C13-00 |
| filingDate | 1992-05-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 1996-09-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4e45573378b3ef1c5ab398574ff26ee1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d3b372a17a4e5a79148e677a5c697255 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b9a9fb0ed877b098bb5f89e3059ec4f9 |
| publicationDate | 1996-09-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-0543961-B1 |
| titleOfInvention | PROCESS FOR CLEANING PRECISION OPTICS OR OPTICAL ASSEMBLIES WITHOUT PRODUCING EMISSIONS, ESPECIALLY CFCs |
| abstract | (a) A process for emission-free cleaning of precision optics consists of: pretreatment consisting of cleaning in a bath containing buffered tapwater to which tensides are added as a wetting agent, including circulation and very fine filtration of the bath, and in addition the use of ultrasound, preferably at variable frequencies and amplitudes; then rinsing with buffered tapwater containing no wetting agent with simultaneous very fine filtration and the action of ultrasound, followed by further cleaning and rinsing, in turn followed by rinsing in buffered deionised water under the action of ultrasound and agitation in deionised water with the simultaneous fine filtration of the bath; (b) decomposition of organic impurities and the residual tensides to CO2 using short-wave UV radiation or highly accelerated electrons or a glow discharge while maintaining an unpressurised oxygen atmosphere or an oxygen atmosphere pressure of up to 5 bars or an unpressurised ozone atmosphere or an ozone atmosphere pressure of up to 2 bars; (c) testing the boundary surfaces of the glass optics with respect to reactions with organic radicals for decomposition reactions at the glass surface or changes in the surface geometry; (d) main treatment consisting of the following steps: driving the water from the glass surface, e.g. by means of non-volatile, hydrophobic, reactive substances or non-volatile hydrophobic substances; sealing the surface by the formation of a film with UV or electron radiation and coating the surfaces, the surface sealing layer being decomposed to metal oxide by a glow discharge or activated by a glow discharge. Following this CFC-free cleaning process, the optical component concerned can be treated further, for example by the application of a cementing or antireflection layer. |
| priorityDate | 1991-06-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 27.