http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0527058-A1

Outgoing Links

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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-30
filingDate 1992-08-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_34ef2c3134dda736002971da3d07e283
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a512e74a9b7464a6d7d20cda1907d0a7
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http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_26696e318d784cba1b982dc5b175f6bc
publicationDate 1993-02-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-0527058-A1
titleOfInvention Apparatus for controlling a developing solution
abstract The developing solution is used in developing photosensitive organic resin (photoresist) in a liquid crystal board manufacturing process, printed circuit board manufacturing process or the like. n The apparatus comprises means, such as an absorption photometer (16), for detecting the dissolved resin concentration in the developing solution and means, such as an electric conductivity meter (15), for detecting the alkali concentration of the developing solution. Means (3, 18, 21, 22, 24, 25, 26, 28) respond to the two detection means (15, 16) by replenishing the developing solution with undiluted developing solution and/or pure water to produce a desired dissolved resin concentration and a desired alkali concentration. Thus, the developing performance of the developing solution may be kept constant. Down time is save by removing the need to stop the manufacturing process to completely change the developing solution.
priorityDate 1991-08-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 24.