| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1e70c0aeade92d7571d955d3b90ea06e |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0233
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-029
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
1991-02-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_85dfda9ab6e2a11ce635ec4e6eea0d25
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d3a30ee56fed250bc50f1f6f0f265b21
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0c2d81b6d5177cf054af85fa20ee87b7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b116371e6acbf3f1349d84f057e1baed |
| publicationDate |
1993-01-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-0524250-A1 |
| titleOfInvention |
Resist material for use in thick film resists |
| abstract |
Excellent resolution and sensitivity are obtained in the configuration of resist used in the manufacture of devices and masks, using a specific composition. This composition uses in particular polymers having fractions of alpha-alkoxyalkyl esters of carboxylic acid and / or of hydroxyaromatic ether labile of recurrent pendant acids, in the presence of a substance constituting an acid generator during exposure to actinic radiation. |
| priorityDate |
1990-04-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |