| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b62a061db267544224c10495ee0cd640 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2601-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2603-68 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C7-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C4-22 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C13-61
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C13-15
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C2-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C4-22 |
| filingDate |
1992-04-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_449fbf13bf630abb0b638a197de32631
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_92c6763044521c0791c8ccbb40bece74
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_13ed43dcaed89a9ebe8caddc8e8fe16d |
| publicationDate |
1992-10-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-0509445-A1 |
| titleOfInvention |
A process for the vapor-phase thermal cracking of dicyclopentadiene and a process for the manufacture of high purity dicyclopentadiene |
| abstract |
Recently, as a process for manufacturing cyclopentadiene resin-shaped articles, an attention has been given to reaction injection molding (RIM). To conduct RIM, it is necessary to use high purity dicyclopentadiene (DCPD) as the raw material. Vapor-phase thermal cracking of DCPD is usually used as a step of process for manufacturing high purity DCPD. Hithertofore, when coducting thermal cracking of DCPD, coke formation within cracking tubes is the most serious and troublesome problem. A vapor-phase thermal cracking process for resolving the problem by a very simple procedure is described herein. Further, a process for manufacturing high purity DCPD suitable as a raw material for use in RIM utilizing the vapor-phase thermal cracking process just mentioned above is also described. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2006011873-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112706349-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-9516652-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11465951-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2004094348-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-1093527-C
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-1055674-C
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-1093528-C |
| priorityDate |
1991-04-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |