| abstract |
A thin film capacitor having high performances, e.g. high frequency characteristics, heat resistance and dielectric strength, and capable of meeting demands for high integration and miniaturization of electronic devices, which comprises an electrically conductive substrate, a silica thin film formed on the substrate by bringing the substrate into contact with an aqueous solution of hydrosilicofluoric acid supersaturated with silica, and an electrically conductive film formed as an electrode on the silica thin film. |