| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5d9f3ca41550d315642580237250c5b0 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S438-933 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-301
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4485 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-448
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F9-6596
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-203
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F5-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F9-80
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F19-00 |
| filingDate |
1990-10-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1994-05-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bfdca639afecedf3d84dc0ae6ae709f2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fc614387d40af0c7a7f365c9ddb61026 |
| publicationDate |
1994-05-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-0497907-B1 |
| titleOfInvention |
Vapor depostion process for depositing an organo-metallic compound layer on a substrate |
| abstract |
The invention comprises applying to a substrate a precursor of an organo-metallic compound, the precursor preferably consists of one or more pairs of ligand substituted Group III and V elements. The precursor is decomposed and deposits onto a receiving layer held at the decomposing temperature of the vaporized material. |
| priorityDate |
1989-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |