http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0490966-A4
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0236 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-30 |
| filingDate | 1990-09-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 1992-10-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-0490966-A4 |
| titleOfInvention | Radiation-sensitive compositions containing fully substituted novolak polymers |
| abstract | In a photoresist composition comprising a novolak polymer and a photosensitizer, the improvement which is characterized by the use of a novolak polymer which comprised the reaction product of an aldehyde and a mixture of phenolic compounds containing at least about 2 % by weight of at least one phenolic compound selected from the group consisting of 2,3,5 -trimethylphenol and 2,3-dimethylphenol or mixtures thereof. |
| priorityDate | 1989-09-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 120.