| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5d9f3ca41550d315642580237250c5b0 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B41-91
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B41-009
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B41-5346
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-1884 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-146
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C04B41-91
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C04B41-53 |
| filingDate |
1991-06-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_686419222e2708d7b9886988dba44e79 |
| publicationDate |
1992-05-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-0485590-A1 |
| titleOfInvention |
Optical emission spectroscopy to determine etch completion of indium tin oxide |
| abstract |
Indium stannic oxide is etched by a plasma containing CH3 gas. The characteristic intensity of at least one optical transmission line is monitored to determine if the attack is complete. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0147453-B1 |
| priorityDate |
1990-06-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |