| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d2bb724dd58cbb2a73b244e79b0c9e42 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-136
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-107 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-164
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0388
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-031
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate |
1991-07-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a2159b4af1f59b855f67933663bef5bd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3786edd349ffebcbdc2abc56e368249b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_906aad2e480d970bcfbecdd9ef9f0684
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e7a08656a91d3f0bd09ebba6de462711
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ecd9951e4e50c72ce47654a07b471216 |
| publicationDate |
1992-02-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-0469537-A2 |
| titleOfInvention |
Photoimageable electrodepositable photoresist composition |
| abstract |
An electrodepositable photoresist composition comprising an aqueous dispersion of: (a) a water-dispersible neutralized cationic polymeric material having a pendant unsaturation, (b) a nonionic unsaturated material and (c) a photoinitiator; characterized in that it can form smooth, thin and pinhole free coatings and further characterized in that the film is capable of being selectively insolubilized by patterned radiation exposure such that the unexposed portion of the film is soluble in dilute aqueous acid and the exposed portion is insoluble in said aqueous acid. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/GB-2408046-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-9812789-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-9919369-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0573053-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/GB-2408046-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6559222-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5474666-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0599308-A1 |
| priorityDate |
1990-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |