http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0465064-A2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e5db580deca7130dbe51805c6c608b35 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-36 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 1991-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4b1d7a229d681ed86381e63dbc81ce06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_02602d7bf4a6b83c0a7c1feabedae8f0 |
| publicationDate | 1992-01-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-0465064-A2 |
| titleOfInvention | Resist and process for forming patterns using the same |
| abstract | A process for patterning, which comprises applying a resist material comprising a mixture of at least one polymer selected from the polymers represented by the following formulae I and II,n n n wherein R₁ represents an aryl or an aralkyl group, R₂ represents hydrogen or an alkyl group, R₃, R₄, R₅ and R₆ independently represent hydrogen, a halogen atom, an alkyl, an aryl or an aralkyl group, with the proviso that at least one of R₃, R₄, R₅ and R₆ represents an aryl or aralkyl group, with a substance which generates an acid by exposure on a substrate to be treated, followed by exposure and heat treatment, and then developing the system in a downflow stream of oxygen-containing plasma. |
| priorityDate | 1990-06-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 51.