Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0236 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 |
filingDate |
1991-05-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_01948ad40e3ea52913e3224ee92148c9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a9b0528a8ae6ad84bf0d1255548c1110 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_04f17fe902497fc83a69f64727904630 |
publicationDate |
1991-12-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
EP-0460416-A1 |
titleOfInvention |
Positive resist composition |
abstract |
A positive resist composition comprising a radiation-sensitive compound and an alkali-soluble resin which is obtainable by a condensation reaction of an aldehyde and a specific hydroxyl group-containing compound (I) can improve heat resistance without deterioration of sensitivity and film thickness retention. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0628599-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0589309-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0564997-A2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0677789-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0564997-A3 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0628599-A4 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5876895-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5800966-A |
priorityDate |
1990-06-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |