| abstract |
A linear alternating copolymer of 2-diazo-4-cyclopentene-1,3-dione and styrene is obtained under mild radical conditions. This copolymer is deep u.v. (260-300 nm) and/or KrF excimer laser (248 nm) photosensitive. A single-component, negative or positive deep u.v. photoresist of this copolymer is provided. A crosslinked 2-diazo-4-cyclopentene-1,3-dione-styrene copolymer is prepared by diazo transfer reaction of the linear alternating 4-cyclopentene-1,3-dione-styrene copolymer. 10-Oxa-exo-tricyclo (5.2.1.0²,⁶)-deca-8-ene-4-diazo-3,5-dione, a precursor of 2-diazo-4-cyclopentene-1,3-dione, is prepared by an improved method involving a polymer reagent. |