| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4ddcb273a108a5d8472b335280098e06 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0163 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-016 |
| filingDate |
1990-07-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a019ad0c9ae31d720d07866badf23e3e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4daf5504408fa55aa4bda89ea439e3f2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7482e2b09c146de7a60ad7a3c46984ce
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1fb3baef8a0b3b6c804b0b5869c616ae
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3b072f1f665595973691f9c24f93bca6 |
| publicationDate |
1991-01-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-0410256-A1 |
| titleOfInvention |
Photosensitive composition |
| abstract |
Photosensitive mixtures of a polymer and a photoactive component which can be developed in an alkaline aqueous solution then show good bleaching behavior in the DUV range, the photoactive component having good solution inhibitor properties and not volatilizing during the drying process if the photoactive component is diazotetronic acid or a diazotetronic acid derivative following structure is: wherein the radicals R are identical or different and are H, alkyl, cycloalkyl, aryl or a silicon-containing radical. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6884566-B2 |
| priorityDate |
1989-07-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |