| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6b822ee046eb6c45d1e3bd9ce9c1782e |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-1884
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-13439
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-1055 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-105
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01B13-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-58
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1343
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L39-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01B5-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1333 |
| filingDate |
1990-06-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_69cb39e13963a5ae13b973d17b74eb8e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b930d04ab4d4d6bccdc1172c35d1f1db
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_791ef8729fea22f67b3c71f8c9e9029c |
| publicationDate |
1990-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-0403936-A2 |
| titleOfInvention |
Method for producing a conductive oxide pattern |
| abstract |
A conductive oxide film (2) is formed on a substrate (1) at a low temperature. The formed conductive oxide film (2) is not very dense because of the low temperature. Therefore the formed conductive oxide film (2) can easily be etched by an etchant having a weak etching capability. And by the etching a pattern of the formed conductive oxide film (2) is produced. The patterned conductive oxide film is oxidized at a temperature in the range of 100-400°C. In this way a conductive oxide pattern is produced in a shorter time in the method of the present invention than in a conventional method and the conductive oxide pattern produced by the method of the present invention has the almost same resistivity as the conductive oxide pattern produced by the conventional method and has an improved pattern edge and an improved reproducibility. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6310674-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103229275-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9224645-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103229275-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1322145-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7608192-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2008088543-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7888594-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0782039-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8203174-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1322145-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0782039-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8123964-B2 |
| priorityDate |
1989-06-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |