http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0403580-B1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03627f82d4edc6567f9627df6efdde5d |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-023 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 |
| filingDate | 1989-05-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 1997-01-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1689cee79e22ed6ad016b39a6c7ef0e1 |
| publicationDate | 1997-01-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-0403580-B1 |
| titleOfInvention | Light-sensitive novolac resins |
| abstract | Light-sensitive novolac resins and photoresist compositions containing the same are described. The light-sensitive novolac resins are derived by the reaction of a cresol-formaldehyde novolac resin of low molecular weight (500-1500) with a 2-diazo-1,2-naphthoquinone-sulfonyl halide. Positive-acting photoresist compositions containing these light-sensitive resins in combination with a non-light-sensitive novolac resin in a ratio by weight of 1:1 to 1:5 give rise, upon imagewise exposure to light followed by development using an alkaline developer, to resist images exhibiting high contrast, high sub-micron resolution and substantially vertical sidewalls. |
| priorityDate | 1988-08-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 76.