| abstract |
A patterning composition is prepared by mixing a metallic salt of organic acid which separates a metal when reduced (e.g. copper(II) heptanoate), a reducing agent (e.g., 4-methoxy-1-naphthol), which shows reducing activity by being heated and loses the reducing activity by being irradiated by UV light, visible light or infrared light, gelatin and water, the composition is applied on a substrate (3), and the coating (8) is irradiated by UV or visible infrared light through a mask (9) and then heated, thereby to separate metal in a pattern. |