Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-0017 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K1-0346 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J2379-08 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J7-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31133 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322 |
classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K1-03 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J7-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J7-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1337 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-04 |
filingDate |
1989-11-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d5d9e21101310ffb4732785295359033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4f33f72889b430da3946de6ae36e0fbb http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6be674acd1924b3c2f086cc0b97cd4de http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3d0c8292ae3761a5c9a746d7ea7abb94 |
publicationDate |
1990-06-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
EP-0373374-A1 |
titleOfInvention |
Wet etching of cured polyimide |
abstract |
A fully cured or substantially fully cured polyimide is etched by contacting the imide with an aqueous solution of a metal hydroxide such as an alkali metal or alkali earth hydroxide and a compound selected from metal carbonates, sulfates and phosphates. The presence of the carbonate, sulfate or phosphate reduces the undercutting of a resist pattern on the polyimide. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-0067536-A1 |
priorityDate |
1988-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |