Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3e9445e5e3626f36e932c6451a928250 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-107 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03C7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0233 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate |
1989-10-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_30fbd3cd02eeed14ae2eb682436d003b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_80a1d5700087faad1cbb44b34a9ef100 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dd831b6ce64bead0e70acefe39bdee5e |
publicationDate |
1990-05-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
EP-0368800-A2 |
titleOfInvention |
Polyimide-type positive photoresists |
abstract |
a) ein in Polyimid überführbares Präpolymer, b) eine strahlungsempfindliche Chinondiazid-Verbindung sowie gegebenenfalls weitere übliche Zusatzstoffe, in denen das Präpolymer ein vollständig verestertes Polyamidsäure-Polymer ist. The invention relates to positive-working, aqueous-alkaline developable photoresists for the production of relief structures from highly heat-resistant polyimide polymers, comprising at least essentially each in an organic solvent a) a prepolymer which can be converted into polyimide, b) a radiation-sensitive quinonediazide compound and, if appropriate, other customary additives in which the prepolymer is a fully esterified polyamic acid polymer. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-0076002-A1 |
priorityDate |
1988-11-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |