| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-265 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 |
| filingDate |
1989-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3985532f03858d16cca08a13ede64a66
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_39524b016660c712714d2acd3107544a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_21213ff99e5d147f730e03f36c41e9d2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f094f0db25b98e1e87cca528100c3b27
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ce17adb05e1cc2c21125721e66a9dec4 |
| publicationDate |
1990-05-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-0366937-A2 |
| titleOfInvention |
Method of forming relief patterns and use thereof |
| abstract |
A relief pattern is formed by exposing a portion of a photosensitive layer of polymeric material having reactive hydrogen functional groups and/or reactive hydrogen functional precursor groups to actinic light and then contacting the layer with a multifunctional organometallic material containing at least two functional groups which are reactive with the reactive hydrogen groups of the polymeric material to thereby render the thickness of the layer at the exposed portion different from the thickness of the layer at the unexposed portion. The relief pattern can, in turn, be used in optical disks to fabricate the servo-tracks. Also, the relief pattern can be used for producing a lithography mask for dry etching. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5716740-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6180294-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6686104-B1 |
| priorityDate |
1988-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |