http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0366503-A3
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0755 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0758 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 |
| filingDate | 1989-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 1991-04-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-0366503-A3 |
| titleOfInvention | Chemical compositions for improving photolithographic performance |
| abstract | Chemical compositions are presented that provide an increased rate of nprocessing in a photolithography process in which a bleachable layer on top of na resist is bleached to produce a contact mask and then the resist is exposed nthrough this contact mask. These compositions have increased oxygen npermeability and increased solubility for a bleachable dye. Also, a class of dyes nis presented that increase the process speed. |
| priorityDate | 1988-10-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 19.