http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0358517-B1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ead66f8f0715cee71cf4ecae4104511f |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0758 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03C1-72 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 |
| filingDate | 1989-09-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 1995-11-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4e9b5341833130312f6c57e68b01bad0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dd012dacdea61612f442031a5679d5b4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_01cccc3cfa15a853393000a6d999dd65 |
| publicationDate | 1995-11-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-0358517-B1 |
| titleOfInvention | Compositions including a phenolic resin and a sensitizer |
| abstract | A composition is described which comprises a phenolic resin and a sensitizer effective, when exposed to actinic radiation, to provide alkali solubility to said composition. The resin is represented by the formula (I) or (II): <CHEM> wherein R is a hydrogen atom, a halogen atom, an alkyl group, an alkoxyl group, an alkaryl group or an aryl group, and R may be the same or different within the polymer; R min is a silyl group; and n and n min +m are greater than 3. The composition may be used as a photoresist and exhibits high thermal and plasmal resistance and good dissolution characteristics. |
| priorityDate | 1988-09-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 142.