http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0323427-A2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3c82fea9cd3dc48540ebd26d3b952479 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0226 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-022 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 1988-12-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fd1647be11006e591c5afbd96d00dd48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1bed82812da215d70ee6e1b26c3bda90 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_07575e6b2135ce027d2956c5fc36b5f7 |
| publicationDate | 1989-07-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-0323427-A2 |
| titleOfInvention | Light-sensitive compositions with phenol resins and quinone diarides |
| abstract | Photosensitive compositions containing phenolic resins and diazoquinone derivatives usable as photoresists in the formation of high resolution patterns in the manufacture of integrated circuits.n n n These compositions have better contrast and better selectivity thanks to the addition of small amounts of a condensed polycyclic aromatic sulfonic or carboxylic acid, in the form of the free acid and / or of an ammonium salt and / or of an acid halide, the cation of the ammonium salt having the formula wherein R₁, R₂, R₃ and R₄ = hydrogen, C₁-C₄-alkyl or C₁-C₄-hydroxyalkyl.n n n The process for forming negative patterns comprises the following stages: (a) covering a substrate with the photosensitive composition, (b) exposure according to the image to ultraviolet radiation, (c) treating the exposed composition with a silicon compound such that the silicon compound is selectively absorbed in the irradiated parts and (d) development by the dry process in order to selectively remove the non-irradiated parts. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5756256-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1895576-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5202217-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0412457-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1895576-A4 |
| priorityDate | 1987-12-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 124.