http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0315774-A2

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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C5-315
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filingDate 1988-10-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_83ade0e9fe5014ed674af5393c80d05f
publicationDate 1989-05-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-0315774-A2
titleOfInvention System for the production of dot-etched lithographic films
abstract The present invention relates to a system for producing point-etched lithographic films, consisting of a light-sensitive silver halide material for tanning development and an etching solution, the light-sensitive material having different layers containing pigments or dyes with acidic groups which are resistant to the processing baths and with bases in organic solvents form soluble salts, and the etching solution contains a base ionizing the pigment or the dye and a solvent for the ion pair formed.
priorityDate 1987-10-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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